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  Extreme ultraviolet (EUV) lithography Extreme ultraviolet (EUV) lithography is a good option for manufacturers who want to manufacture smaller, faster processors. EUV uses a laser with a wavelength of 13.5 nanometers. It's much shorter than deep UV, so it's ideal for putting tiny transistors onto complex chips. EUV is also more accurate than UV, making it easier to create high-quality printed lines. A high-NA laser also reduces downtime. In addition to this, EUV is cheaper to produce the same number of chips. According to Coherent Market Insights, The global Extreme Ultraviolet (EUV) Lithography market was valued at US$ 4,660.4 Mn in 2020 and is expected to reach US$ 29,648.4 Mn by 2028 at a CAGR of 26.1% between 2021 and 2028. The next generation of Extreme Ultraviolet (EUV) Lithography can be productive, but there are still many practical issues. First of all, a good light source is essential. A discharge-plasma-based source is a promising option, but it is expensive ...